Theknoloji ea Physical Vapor Deposition (PVD) e bolela ts'ebeliso ea mekhoa ea 'mele tlas'a maemo a vacuum ho etsa mouoane holim'a mohloli oa lintho tse bonahalang (tse tiileng kapa tse metsi) hore e be liathomo kapa limolek'hule tsa gaseous, kapa li ionise ka mokhoa o itseng ho li-ion, ebe li feta ka tlaase. - khase ea khatello (kapa plasma). Ts'ebetso, theknoloji ea ho kenya filimi e tšesaane e nang le ts'ebetso e ikhethang holim'a substrate, le ho beha mouoane oa 'mele ke e' ngoe ea mekhoa ea mantlha ea kalafo ea holim'a metsi. Theknoloji ea ho roala ea PVD (physical vapor deposition) e arotsoe haholo ka mekhahlelo e meraro: vacuum evaporation coating, vacuum sputtering coating le vacuum ion coating.
Lihlahisoa tsa rona li sebelisoa haholo-holo mouoane oa mocheso le ho roala ha metsi. Lihlahisoa tse sebelisoang ho beha mouoane li kenyelletsa terata ea tungsten strand, liketsoana tsa tungsten, liketsoana tsa molybdenum, le likepe tsa tantalum, lihlahisoa tse sebelisoang ho roala beam ea electron ke terata ea cathode tungsten, copper crucible, tungsten crucible, le likarolo tsa molybdenum. sepheo, sepheo sa chromium, le sepheo sa titanium-aluminium.
