Theknoloji ea Physical Vapor Deposition (Physical Vapor Deposition, PVD) e bolela ts'ebeliso ea mekhoa ea 'mele tlas'a maemo a vacuum ho etsa mouoane holim'a mohloli oa lintho tse bonahalang (o tiileng kapa oa metsi) hore e be liathomo kapa limolek'hule tse nang le khase, kapa li ionise ka mokhoa o itseng ho li-ion, le ho feta ka khase e tlaase (kapa plasma). Ts'ebetso, theknoloji ea ho kenya filimi e tšesaane e nang le ts'ebetso e ikhethang holim'a substrate, le ho beha mouoane oa 'mele ke e' ngoe ea mekhoa ea mantlha ea kalafo ea holim'a metsi. Theknoloji ea ho roala ea PVD (physical vapor deposition) e arotsoe haholo ka mekhahlelo e meraro: vacuum evaporation coating, vacuum sputtering coating le vacuum ion coating.
Lihlahisoa tsa rona li sebelisoa haholo-holo ho tsoa mouoane oa mocheso le ho roala ka sputtering. Lihlahisoa tse sebelisoang ha ho kenngoa mouoane li kenyelletsa terata ea tungsten strand, liketsoana tsa tungsten, liketsoana tsa molybdenum, le likepe tsa tantalum, lihlahisoa tse sebelisoang ho koaheloa ke electron beam ke terata ea cathode tungsten, copper crucible, tungsten crucible, le likarolo tsa ts'ebetso ea molybdenum. lipheo.
